Effects of Socioeconomic Status on Clinical Outcomes with Ventricular Assist Devices.
Journal – Clinical cardiology
Publication date – Sep – 2018
Authors – Ahmed, MM; Magar, SM; Jeng, EI; Arnaoutakis, GJ; Beaver, TM; Vilaro, J; Klodell, CT; Aranda, JM
Keywords – cardiovascular intervention, ventricular assist device
Open access – Yes
Speciality – Cardiothoracic surgery, Other, Vascular surgery
World region Northern America
Country: United States of America
Language – 2018
Submitted to the One Surgery Index on October 5, 2018 at 12:00 am
Lower socioeconomic status (SES) is a known risk factor for worse outcomes after major cardiovascular interventions. Furthermore, individuals with lower SES face barriers to evaluation for advanced heart failure therapies, including ventricular assist device (VAD) implantation.Examination of the effects of individual determinants of SES on VAD outcomes will show similar survival benefit in patients with lower compared with higher SES.All VAD implants at the University of Florida from January 2008 through December 2015 were reviewed. Patient-level determinants of SES included place of residence, education level, marital status, insurance status, and financial resources stratified by percent federal poverty level. Survival or transplantation at 1 year, 30-day readmission, implant length of stay (LOS), and an aggregate of VAD-related complications were assessed in univariate fashion and multivariable regression modelling.A total of 111 patients were included (mean age at time of implant 57.6 years, 82.8% men). More than half received destination therapy. At 1 year, 78.3% were alive on device support or had undergone successful transplantation. There were no differences in survival, 30-day readmission, or aggregate VAD complications by SES category. Although patients with lower levels of education had longer LOS in univariate analysis, on multivariable ordinal regression modelling, this relationship was no longer seen.Patients with lower SES receive the same survival benefit from VAD implantation and are not more likely to have 30-day readmissions, complications of device support, or prolonged implant LOS. Therefore, VAD implantation should not be withheld based on these parameters alone.
OSI Number – 20235
PMID – 30225924